Thin Film Deposition Equipment

Building the intricate layers of a semiconductor device requires the deposition of thin films of various materials. Techniques such as Chemical Vapor Deposition (CVD), Physical Vapor Deposition (PVD), and Atomic Layer Deposition (ALD) are employed for this purpose. Key manufacturers of thin film deposition equipment include Applied Materials (USA) , Tokyo Electron (Japan) , Lam Research (USA) , Novellus Systems (USA, now part of Lam Research) , and ASM International (Netherlands). This indicates a strong tripolar presence of US, Japanese, and Dutch companies in this technologically critical area of semiconductor manufacturing, reflecting a global distribution of expertise in these advanced deposition techniques.